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Problem Reporting Guide
Problem Reporting Guide
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StatusDOWNUP
Issue Date and Description

Gun tripBill Repaired the Gun Grip

Estimated Fix Date and Comment

Bill Rowe will inspect on Tuesday

Responding Staff

Bill


/wiki/spaces/BNCWiki/pages/6235752

  

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iLab NameRaith eLine E-Beam Writer
iLab KioskBRK Lithography Core
FICJoerg Appenzeller
OwnerBill Rowe
LocationBRK 1239
Max. Wafer4"/100 mm




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Overview

General Description

The Raith e_LiNE is a 100eV to 30keV system using a Schottky TFE filament with a 20MHz pattern processor. It is ideal for nanotech research in carbon nanotubes and nanowires.

Specifications

  • Stage travel: 100 mm x 100 mm.
  • Maximum substrate size: 100 mm x 100 mm.
  • Minimum feature size: <20 nm.
  • Minimum beam size: <2 nm.
  • Writing current: 5 pA - 20 nA.

Technology Overview 



Sample Requirements and Preparation



Standard Operating Procedure

View file
nameRaith Purdue.pdf
pageRaith eLine E-Beam Writer - Internal Resources
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Questions & Troubleshooting


Process Library

References

Raith eline instructions_ND