Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.

Status	Up
Issue Date and Description	Cleaned fiber optics
Estimated Fix Date and Comment	11/4/2024
Responding Staff	Bill

iLab Name	Raith eLine E-Beam Writer
iLab Kiosk	BRK Lithography Core
FIC	Joerg Appenzeller
Owner	Bill Rowe
Location	BRK 1239
Max. Wafer	4"/100 mm

Overview

General Description

The Raith e_LiNE is a 100eV to 30keV system using a Schottky TFE filament with a 20MHz pattern processor. It is ideal for nanotech research in carbon nanotubes and nanowires.

Specifications

Stage travel: 100 mm x 100 mm.
Maximum substrate size: 100 mm x 100 mm.
Minimum feature size: <20 nm.
Minimum beam size: <2 nm.
Writing current: 5 pA - 20 nA.

Birck Nanotechnology Center Wiki

Raith eLine E-Beam Writer

Analytics

Overview

General Description

Specifications

Technology Overview

Sample Requirements and Preparation

Standard Operating Procedure

Questions & Troubleshooting

Process Library

References

Related content