Raith eLine E-Beam Writer

Owned by Wirth, Justin C
Last updated: Jan 04, 2024 by wrowe
1 min read


Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.

StatusUp
Issue Date and Description

1/2/2024 Needs a replacement Loadlock Controller..Now working

Estimated Fix Date and Comment

1/03/2024

Responding Staff

Bill

/wiki/spaces/BNCWiki/pages/6235752

  

iLab NameRaith eLine E-Beam Writer
iLab KioskBRK Lithography Core
FICJoerg Appenzeller
OwnerBill Rowe
LocationBRK 1239
Max. Wafer4"/100 mm

Overview

General Description

The Raith e_LiNE is a 100eV to 30keV system using a Schottky TFE filament with a 20MHz pattern processor. It is ideal for nanotech research in carbon nanotubes and nanowires.

Specifications

  • Stage travel: 100 mm x 100 mm.
  • Maximum substrate size: 100 mm x 100 mm.
  • Minimum feature size: <20 nm.
  • Minimum beam size: <2 nm.
  • Writing current: 5 pA - 20 nA.

Technology Overview 



Sample Requirements and Preparation



Standard Operating Procedure


Questions & Troubleshooting


Process Library

References

Raith eline instructions_ND