Raith eLine E-Beam Writer
Status | Up |
Issue Date and Description | Cleaned fiber optics |
Estimated Fix Date and Comment | 11/4/2024 |
Responding Staff | Bill |
Raith eLine E-Beam Writer - Internal Resources
iLab Name | |
|---|---|
iLab Kiosk | |
FIC | Joerg Appenzeller |
Owner | |
Location | BRK 1239 |
Max. Wafer | 4"/100 mm |
Overview
General Description
The Raith e_LiNE is a 100eV to 30keV system using a Schottky TFE filament with a 20MHz pattern processor. It is ideal for nanotech research in carbon nanotubes and nanowires.
Specifications
Stage travel: 100 mm x 100 mm.
Maximum substrate size: 100 mm x 100 mm.
Minimum feature size: <20 nm.
Minimum beam size: <2 nm.
Writing current: 5 pA - 20 nA.
Technology Overview
Sample Requirements and Preparation
Standard Operating Procedure
Questions & Troubleshooting
Process Library