Raith eLine E-Beam Writer

Owned by Wirth, Justin C
Last updated: Nov 04, 2024 by William Rowe
1 min read


Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.

StatusUp
Issue Date and Description

Cleaned fiber optics 

Estimated Fix Date and Comment

11/4/2024

Responding Staff

Bill

/wiki/spaces/BNCWiki/pages/6235752

  

iLab NameRaith eLine E-Beam Writer
iLab KioskBRK Lithography Core
FICJoerg Appenzeller
OwnerBill Rowe
LocationBRK 1239
Max. Wafer4"/100 mm

Overview

General Description

The Raith e_LiNE is a 100eV to 30keV system using a Schottky TFE filament with a 20MHz pattern processor. It is ideal for nanotech research in carbon nanotubes and nanowires.

Specifications

  • Stage travel: 100 mm x 100 mm.
  • Maximum substrate size: 100 mm x 100 mm.
  • Minimum feature size: <20 nm.
  • Minimum beam size: <2 nm.
  • Writing current: 5 pA - 20 nA.

Technology Overview 



Sample Requirements and Preparation



Standard Operating Procedure


Questions & Troubleshooting


Process Library

References

Raith eline instructions_ND