| Page Properties | |||||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| |||||||||||||||||
|
| Insert excerpt | ||||||
|---|---|---|---|---|---|---|
|
iLab Name: C - Tube 03 LTO Dep
iLab Kiosk: BRK Furnace Core
FIC: Shared
Owner: Rich Hosler
Location: Cleanroom - R Bay
Maximum Wafer Size: 6"/150 mm (for all furnaces)
| Table of Content Zone | ||||||||
|---|---|---|---|---|---|---|---|---|
| ||||||||
|
Overview
General Description
Horizontal furnaces for a variety of processes.
Specifications
Process Capabilities:
- Tube 03 - Low Temperature Oxidation (deposition)
Process Temperatures:
- Tube 03 - 400°C maximum
Technology Overview
Sample Requirements and Preparation
Standard Operating Procedure
| Widget Connector | ||
|---|---|---|
|
Questions & Troubleshooting
Process Library