Protemp Horizontal Furnaces
- Wirth, Justin C
- Hosler, Richard S
- Former user (Deleted)
- Daniel A. Hosler
Owned by Wirth, Justin C
Protemp Horizontal Furnaces
iLab Furnace Kiosk
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Protemp Process Data
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iLab Kiosk: BRK Furnace Core
FIC: Shared
Owner: Rich Hosler
Location: Cleanroom - R Bay
Maximum Wafer Size: 6"/150 mm (for all furnaces)
Overview
General Description
Horizontal furnaces for a variety of processes.
| Tube# | Tube Name | Max Temp | Process Capabilities |
|---|---|---|---|
| Tube 1 | RCA Clean Oxidation | 1100°C | Wet / Dry Oxidation (Super-Clean SI users only) |
| Tube 2 | Nitride Deposition | 800°C | LPCVD Nitride Deposition |
| LTO Deposition | 400°C | Low Temperature Oxidation Deposition | |
| Tube 4 | Field Oxide Growth | 1100°C | West / Dry Oxidation (General Use) |
| Tube 5 | Anneal | 1100°C | Anneal |
| Tube 6 | Polysilicon Deposition | 650°C | Polysilicon |
| Tube 7 | General Oxidation | 1100°C | Wet / Dry Oxidation (III/V Materials) |
| Tube 8 | Phosphorus Drive | 1100°C | Phosphorous Deposition |
| Tube 9 | TEOS Deposition | 800°C | TEOS |
Standard Operating Procedure
Protemp furnace SOP - Released 3/10/2021
Training Videos:
- Thermal Oxidation
- CVD