Protemp Horizontal Furnaces

iLab Furnace Kiosk

iLab Kiosk: BRK Furnace Core
FIC: Shared
Owner: Rich Hosler
Location: Cleanroom - R Bay
Maximum Wafer Size: 6"/150 mm (for all furnaces)

Horizontal furnaces for a variety of processes.

Tube#	Tube Name	Max Temp	Process Capabilities
Tube 1	RCA Clean Oxidation	1100°C	Wet / Dry Oxidation (Super-Clean SI users only)
Tube 2	Nitride Deposition	800°C	LPCVD Nitride Deposition
Tube 3	LTO Deposition	400°C	Low Temperature Oxidation Deposition
Tube 4	Field Oxide Growth	1100°C	West / Dry Oxidation (General Use)
Tube 5	Anneal	1100°C	Anneal
Tube 6	Polysilicon Deposition	650°C	Polysilicon
Tube 7	General Oxidation	1100°C	Wet / Dry Oxidation (III/V Materials)
Tube 8	Phosphorus Drive	1100°C	Phosphorous Deposition
Tube 9	TEOS Deposition	800°C	TEOS

Protemp furnace SOP - Released 3/10/2021

Training Videos:

- Thermal Oxidation

- CVD