| Expand | ||||||||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| ||||||||||||||||||||
|
iLab Name: Nanonex
iLab Kiosk: BRK Lithography Core
FIC: Minghao Qi and Alexandra Boltasseva
Owner: Bill Rowe
Location: Cleanroom - N Bay
Maximum Wafer Size: 8"/200 mm
| Table of Content Zone | ||||||||
|---|---|---|---|---|---|---|---|---|
| ||||||||
|
Overview
General Description
The Nanonex is a nano-imprint lithography tool for making multiple copies of small geometry patterns.
Specifications
- Molds and substrates from piece size up to 100mm.
- Pressure: up to 550psi
- Temperature: up to 250°C
- Minimum resolution: <10nm
- Capable of Thermal and UV (Photo) Imprinting
- Can handle up to an 8 inch wafer
- Quick cycle times-usually less than 2 minutes
Technology Overview
Sample Requirements and Preparation
Standard Operating Procedure
Questions & Troubleshooting
Process Library