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 Tool Status


Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.

StatusUP
Issue Date and Description


Estimated Fix Date and Comment

Responding Staff

iLab Name: Nanonex
iLab Kiosk: BRK Lithography Core
FIC: Minghao Qi and Alexandra Boltasseva
Owner: Bill Rowe
Location: Cleanroom - N Bay
Maximum Wafer Size: 8"/200 mm

Overview

General Description

The Nanonex is a nano-imprint lithography tool for making multiple copies of small geometry patterns.

Specifications

  • Molds and substrates from piece size up to 100mm.
  • Pressure: up to 550psi
  • Temperature: up to 250°C
  • Minimum resolution: <10nm
  • Capable of Thermal and UV (Photo) Imprinting
  • Can handle up to an 8 inch wafer
  • Quick cycle times-usually less than 2 minutes

Technology Overview 

 


Sample Requirements and Preparation


Standard Operating Procedure


Questions & Troubleshooting



Process Library

References


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