Protemp Horizontal Furnace - Tube 02 - Silicon Nitride Deposition

iLab Name: C - Tube 02 Nitride Dep
iLab Kiosk: BRK Furnace Core
FIC: Shared
Owner: Rich Hosler
Location: Cleanroom - R Bay
Maximum Wafer Size: 6"/150 mm (for all furnaces)

Overview

General Description

Horizontal furnaces for a variety of processes.

Specifications

Process Capabilities:

• Tube 02 - LPCVD Nitride Deposition

Process Temperatures:

• Tube 02 - 800°C maximum

Technology Overview 

Sample Requirements and Preparation

Standard Operating Procedure

Questions & Troubleshooting

How long can my recipe go for with this tube? I want to make a thick deposition.

The current maximum length at 800°C is approximately 76 minutes. If this is exceeded you risk melting the silicone o-ring holding the Ammonia and Dicholorosliane in. If you need to do depositions longer than 76 minutes you can re-run the cycle after it fully completes the first time, which gives the o-ring time to cool down.

Process Library

References