Tube 02 Nitride Dep

2024-12-20 to 2025-01-02: Reduced Holiday Operations

Dear Birck Research Community,

The Purdue winter recess begins effective Friday afternoon December 20th and concludes Thursday morning, January 2. The university is officially closed during this time. As we have done in past years, the Birck Nanotechnology Center will remain available for research but will be unstaffed and hazardous gasses will be unavailable. Lab work may otherwise proceed, though any fume hood work must be done with someone else present in the same laboratory or cleanroom bay (the "buddy" system). Click the link above to get more detail about equipment conditions and rules.


Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.

StatusUP
Issue Date and Description


Estimated Fix Date and Comment

Responding Staff


Protemp Horizontal Furnace - Tube 02 - Silicon Nitride Deposition

iLab Name: C - Tube 02 Nitride Dep
iLab Kiosk: BRK Furnace Core
FIC:
 Shared
Owner: Rich Hosler
Location:
Cleanroom - R Bay
Maximum Wafer Size: 
6"/150 mm (for all furnaces)

Overview


General Description

Horizontal furnaces for a variety of processes.

Specifications

Process Capabilities:

  • Tube 02 - LPCVD Nitride Deposition

Process Temperatures:

  • Tube 02 - 800°C maximum

Technology Overview 


Standard Operating Procedure

 - CVD


Questions & Troubleshooting

How long can my recipe go for with this tube? I want to make a thick deposition.


The current maximum length at 800°C is approximately 76 minutes. If this is exceeded you risk melting the silicone o-ring holding the Ammonia and Dicholorosliane in. If you need to do depositions longer than 76 minutes you can re-run the cycle after it fully completes the first time, which gives the o-ring time to cool down.