Spinner 1: Acetone Soluble
Novolak Based
AZ 1500
AZ 5200
AZ 9200
Shipley 1800
SPR 220
ma-N 2400
Acrylic
PMMA (495, 950, Complymers)
Adhesion Promoters
SurPass 4000
Solvents
Acetone
Methanol
IPA
DI H20
PGMEA (AZ EBR Solvent, Microposit Thinner P)
NOT
HMDS
Toluene
NMP
Requirements:
A) Complete removed in acetone if dried.
B) Will not polymerize in contact with acetone, PGMEA, or H20.
C) No vapors which harden resist (NMP, Ammonia, HMDS, Toluene?, Chlorobenzene?) or dope substrates.
Spinner 3: EBL (foil required)
EBL Resists:
HSQ/XR-1541/FOX
ZEP-520
PMMA
maN 2400
Conductive Polymers:
Aquasave 57xs
Adhesion Promoters:
MAMA(8.5)MAA EL 11
...
With the install of Spinner 3, materials will be segregated by spinner. Please see the following page for what spinner you will need to use for a particular material once the spinners are reclassified.
The categories and allowed chemical/spinner pairings are still being refined and your feedback would be appreciated. Please comment on this page (at the page bottom) with any questions, comments, or feedback.
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Spinner 1: General Spun on Materials (Foil required)
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Spinner 1: SCS G3P-8
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Complete aluminum foil covering of the spinner bowl is required! |
Novolak ResistsAZ 1500 Series - AZ 5200 Series
- AZ 9200 Series
- Shipley 1800 Series
- SPR 220 Series
- ma-N 2400 Series
Acrylic EBL Resists- PMMA
- PMMA + Copolymers
- ZEP 520 A / CSAR 62 / AR-P 6200
Spin on Glass EBL ResistsNIL ResistsLOR/PGMI (Cyclopentanone/PGME)SU-8 EpoxySolvents- Acetone
- Methanol
- IPA
- DI H20
- PGMEA (AZ EBR Solvent, Microposit Thinner P)
Other: As needed for removal of approved resists. Any Litho hood approved solvents may be used as appropriate, EXCEPT HMDS, Toluene, or NMP.
Conductive PolymersAquasave 57xs ESpacer 300 - DisChem DisCharge
Plastics- Polyimide
- Polystyrene
- Poly(vinyl alcohol)
- Poly(ethyleneimine)
Etch Protectants/Waxes - Protek A2-22
- Epotek OE
- Protek PSB and PS
- Protek B2 and B2 Primer
- Protek B3 and B3 Primer
Spin on dopantsOther Spin on Materials- Polypropylene carbonate
- Graphite oxide
- Alq3
- Pelc conductive silver paint
- PST toluene
- Spin on teflon
- Coronene in toluene
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Spinner 2: SCS 6800
Warning |
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Complete aluminum foil covering of the spinner bowl is required! |
Warning |
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| ABSOLUTELY NO 100% HMDS, Toluene, or NMP due to contamination concerns. Discuss with BNC staff you need assistance removing resists. |
Warning |
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title | Metal and metal ion containing solutions are prohibited! |
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| Prohibited materials, compared with Spinner 1 Spin on dopantsOther Spin on Materials- Polypropylene carbonate
- Graphite oxide
- Alq3
- Pelc conductive silver paint
- PST toluene
- Spin on teflon
- Coronene in toluene
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Novolak ResistsAZ 1500 Series - AZ 5200 Series
- AZ 9200 Series
- Shipley 1800 Series
- SPR 220 Series
- ma-N 2400 Series
Acrylic EBL Resists- PMMA
- PMMA + Copolymers
- ZEP 520 A / CSAR 62 / AR-P 6200
Spin on Glass EBL ResistsNIL ResistsLOR/PGMI (Cyclopentanone/PGME) |
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SU-8 EpoxySolvents- Acetone
- Methanol
- IPA
- DI H20
- PGMEA (AZ EBR Solvent, Microposit Thinner P)
Other: As needed for removal of approved resists. Any Litho hood approved solvents may be used as appropriate, EXCEPT HMDS, Toluene, or NMP.
Conductive PolymersAquasave 57xs ESpacer 300 - DisChem DisCharge
Plastics- Polyimide
- Polystyrene
- Poly(vinyl alcohol)
- Poly(ethyleneimine)
Etch Protectants/Waxes |
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- and PS
- Protek B2 and B2 Primer
- Protek B3
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TBD:
HMDS Spinner formulations
MCC Primer 80/20
P20
Undiluted silanes:
HMDS
AP
Ti prime
Nanoparticles
Liquid diamond monocrystalline (microdiamant)
Spin on dopants
P509 spin on dopant
B155 spin on dopant
Unknown
NIL Resists
Nxr3032
Ormolayer stamp
Nxr 3020
Ormoprime 08
?
Bv
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Spinner 3 : Acetone Soluble Resists
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Spinner 3: Laurell WS-650
Warning |
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title | Only Acetone Soluble Resists! |
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| Only resists that may be completely removed by acetone may be used in Spinner 3. Contact Joon Park with questions about using any chemicals not specifically listed below. |
Warning |
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| ABSOLUTELY NO 100% HMDS, Toluene, or NMP due to contamination concerns. Discuss with BNC staff you need assistance removing resists. |
Novolak ResistsAZ 1500 Series - AZ 5200 Series
- AZ 9200 Series
- Shipley 1800 Series
- SPR 220 Series
- ma-N 2400 Series
Acrylic EBL Resists- PMMA
- PMMA + Copolymers
- ZEP 520 A / CSAR 62 / AR-P 6200
- 80% PGMEA + 20% HMDS Solutions
- MCC Primer 80/20
- Microprime MP-P20
SolventsApproval for new/additional chemicals:Additional materials must be pre-approved, and material must: A) Be completely removed in acetone if dried. B) Not polymerize in contact with acetone, PGMEA, or water. C) Not have vapors which harden resist (NMP, Ammonia, toluene, cholorbenzene) or dope substrates. |
Specifically not permitted in Cleanroom
Silicones/PDMS
Reason: These are impossible to remove chemically once cured, and are not used for lithography processes. Email Joon Park for information on proper curing of HMDS outside the cleanroom.
100% HMDS
Reason: 100% HMDS is extremely hazardous for both skin contact and inhalation. Additionally, in air, it degrades into ammonia upon evaporation, which crosslinks common photoresist. It gives sub-optimal results compared to diluted (80% PGMEA + 20% HMDS) solutions, or SurPass. Contact Justin Wirth with any questions.
- HMDS/Hexamethyldisilazane