Overview
General Description
The Raith e_LiNE is a 100eV to 30keV system using a Schottky TFE filament with a 20MHz pattern processor. It is ideal for nanotech research in carbon nanotubes and nanowires.
Specifications
- Stage travel: 100 mm x 100 mm.
- Maximum substrate size: 100 mm x 100 mm.
- Minimum feature size: <20 nm.
- Minimum beam size: <2 nm.
- Writing current: 5 pA - 20 nA.
Technology Overview
Sample Requirements and Preparation
Standard Operating Procedure
Questions & Troubleshooting
Process Library