Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.

Status	DOWN
Issue Date and Description	26 Jan 2024 MFC failure.
Estimated Fix Date and Comment	19 Apr 2024 Rebuild of exhaust system
Responding Staff	R. Hosler

iLab Furnace Kiosk

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iLab Name: C - Tube 02 Nitride Dep
iLab Kiosk: BRK Furnace Core
FIC: Shared
Owner: Rich Hosler
Location: Cleanroom - R Bay
Maximum Wafer Size: 6"/150 mm (for all furnaces)

Overview

General Description

Horizontal furnaces for a variety of processes.

Specifications

Process Capabilities:

Tube 02 - LPCVD Nitride Deposition

Process Temperatures:

Tube 02 - 800°C maximum

Technology Overview

Sample Requirements and Preparation

Standard Operating Procedure

- CVD

Questions & Troubleshooting

How long can my recipe go for with this tube? I want to make a thick deposition.

The current maximum length at 800°C is approximately 76 minutes. If this is exceeded you risk melting the silicone o-ring holding the Ammonia and Dicholorosliane in. If you need to do depositions longer than 76 minutes you can re-run the cycle after it fully completes the first time, which gives the o-ring time to cool down.