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2024-12-20 to 2025-01-02: Reduced Holiday Operations

Dear Birck Research Community,

The Purdue winter recess begins effective Friday afternoon December 20th and concludes Thursday morning, January 2. The university is officially closed during this time. As we have done in past years, the Birck Nanotechnology Center will remain available for research but will be unstaffed and hazardous gasses will be unavailable. Lab work may otherwise proceed, though any fume hood work must be done with someone else present in the same laboratory or cleanroom bay (the "buddy" system). Click the link above to get more detail about equipment conditions and rules.


Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.

StatusUp
Issue Date and Description

1/2/2024 Needs a replacement Loadlock Controller..Now working

Estimated Fix Date and Comment

1/03/2024

Responding Staff

Bill

/wiki/spaces/BNCWiki/pages/6235752

  

iLab NameRaith eLine E-Beam Writer
iLab KioskBRK Lithography Core
FICJoerg Appenzeller
OwnerBill Rowe
LocationBRK 1239
Max. Wafer4"/100 mm

Overview

General Description

The Raith e_LiNE is a 100eV to 30keV system using a Schottky TFE filament with a 20MHz pattern processor. It is ideal for nanotech research in carbon nanotubes and nanowires.

Specifications

  • Stage travel: 100 mm x 100 mm.
  • Maximum substrate size: 100 mm x 100 mm.
  • Minimum feature size: <20 nm.
  • Minimum beam size: <2 nm.
  • Writing current: 5 pA - 20 nA.

Technology Overview 



Sample Requirements and Preparation



Standard Operating Procedure


Questions & Troubleshooting


Process Library



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