Test Metallization Sources

CHA E-Beam Evaporator #1

Ti, Al, Pd, Au, Ni, Cr

Ti, Au, Pt, Pd, Al, Ni, Ge, Cr, Ag

CHA E-Beam Evaporator #2

Ti, Al, Ni, Au, Pt, Ge

Ti, Au, Pt, Al, Ni, Ge, Cr, Ag

Lesker E-Beam Evaporator - Flexible Substrate Compatible

Ti, Au, Cr, Ni, Al, Pd

Ti, Au, Cr, Pt, Al, Ni, Mo, Pd, Ag, ITO, Al2O3, Ta2O5, SiO₂

Leybold E-Beam Evaporator

Ti, Fe, Ni, Al, Ag, Al2O3, SiO2, Cr, Py, Cu, Au, Co, Si, Mn, Ta2O5, Ge, Ni/Cr, Pt, TiO2, Er

PVD E-Beam Evaporator - Metal/Magnetic Sources

Co, Ni, Cu, Pd, Al, Ti

Cu, Ti, Al, Fe, Ni, Co, Sc, Ta, Py, Pd

Title

Current Sources

Potential Sources

PVD Sputtering System - Flexible Substrate Compatible

ITO, MgO, W, Ti 

SiO2, TiN, Au, Ti, Ag, Cu, Si3N4, Al, Ni, Si, NbTi, Cr, Ge, Pt, Ni/Ti, Nb, Ta, ITO, MgO, W

PVD Sputtering System - 4 Target Magnetic Sources

Fe (restricted use), Co (restricted use), Ru, Ti

Ta, Ru, MgO, Cu, W, NiFe, CoFeB, Mo

PVD Sputtering System - Metal/Dielectric Sources

Cr, Ti, W3Si4 (restricted), Au

Si,Cr, Ge, Ag, Cu, Al, Ti, Ta, W, Au, Nb, NbTi, W3Si4, TiO2, Si3N4, SiO2, TiN, MoSi2, Ru

PVD Sputtering System - 6 Target Magnetic Sources

CoFeB, MgO, Ru, Ta, CoCrPt, CoFe

CoFeB, MgO, Ru, Ta, CoCrPt, CoFe