PVD Sputtering System - 6 Target Magnetic Sources

Owned by Wirth, Justin C
Last updated: May 24, 2022 by lubelski
1 min read


Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.

StatusUp
Issue Date and Description

System back online

Estimated Fix Date and Comment

5/27/2022 if parts don't need to be ordered.

Responding StaffDave Lubeski/Dan Witter



iLab KioskeLog: SubmiteLog: View/EditReport ProblemMSDS Documents

iLab NameC - PVD Sputtering System - 4 Target Magnetic Sources
iLab KioskBRK Evaporation Sputtering Core
FICJoerg Appenzeller
OwnerDave Lubelski
LocationCleanroom - S Bay
Max. Wafer4"/100 mm


Current SourcesCoFeB, MgO, Ru, Ta, CoCrPt, CoFe
Potential SourcesCoFeB, MgO, Ru, Ta, CoCrPt, CoFe

Overview

General Description

6 target magnetic sputtering system.

Specifications


Technology Overview

 No Organics/Polymers Allowed


Sample Requirements and Preparation



Standard Operating Procedure

Please Note: This instrument is billed per  use  based on a 2 hour block

Example : 1  user only uses the tool  per use.  When you vent the system and unload your sample that concludes your reservation .  

Example: If the usage is 10+ minutes past the initial 2 hour reservation, you will be billed for 2 uses


Questions & Troubleshooting



Process Library

References