PVD Sputtering System - Flexible Substrate Compatible

Owned by Former user (Deleted)
Last updated: Oct 28, 2024 by Witter, Daniel Joseph

2024-12-20 to 2025-01-02: Reduced Holiday Operations

Dear Birck Research Community,

The Purdue winter recess begins effective Friday afternoon December 20th and concludes Thursday morning, January 2. The university is officially closed during this time. As we have done in past years, the Birck Nanotechnology Center will remain available for research but will be unstaffed and hazardous gasses will be unavailable. Lab work may otherwise proceed, though any fume hood work must be done with someone else present in the same laboratory or cleanroom bay (the "buddy" system). Click the link above to get more detail about equipment conditions and rules.


Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.

StatusUp
Issue Date and Description

10/28/2024 Breaker work delayed, cancel previous plan

Estimated Fix Date and Comment

Responding StaffDave Lubelski/Dan Witter


iLab KioskeLog: SubmiteLog: View/EditReport ProblemMSDS Documents


iLab NameC - PVD Sputtering System - Flexible Substrate Compatible
iLab KioskBRK Evaporation Sputtering Core
FICHugh Lee
OwnerDave Lubelski
LocationCleanroom - S Bay
Max. Wafer4"/100 mm


Current SourcesAl2O3, W, Co(20)Fe(60)B, Au
Potential SourcesSiO2, TiN, Au, Ti, Ag, Cu, Si3N4, Al, Ni, Si, NbTi, Cr, Ge, Pt, Ni/Ti, Nb, Ta, ITO, MgO, W, Al2O3, CoFeB, TiO2

Overview

General Description

  • Can Accommodate Substrates Up to 4"dia.
  • Reactive Sputtering Capable
    • Water Cooled Stage
    • 4-gun System
  • Base Pressure 2.0x10-6 Torr
  • Gases available N2, Ar, O2

Specifications

For use with substrates of organic materials, polyimides, parylene, etc.

Technology Overview 


Sample Requirements and Preparation


Spin on Polyimide sample for metal deposition must be prepared in cleanroom.

  • Thickness: < 13um
  • Soft bake above 120 C longer than 30 seconds.
  • Curing in cleanroom /wiki/spaces/BNCWiki/pages/6228522 at:
    • 1) 200C for a minimum of 30 minutes
      Followed by: 
    • 2) A minimum of 300 C for a minimum of 60 minutes
  • Gradual cooling to room temperature (cooling overnight)


Standard Operating Procedure

Please Note: This instrument is billed per  use  based on a 2 hour block

Example : 1  user only uses the tool  per use.  When you vent the system and unload your sample that concludes your reservation .  

Example: If the usage is 10+ minutes past the initial 2 hour reservation, you will be billed for 2 uses


Questions & Troubleshooting



Process Library

References