PVD Sputtering System - Flexible Substrate Compatible
Overview
General Description
- Can Accommodate Substrates Up to 4"dia.
- Reactive Sputtering Capable
- Water Cooled Stage
- 4-gun System
- Base Pressure 2.0x10-6 Torr
- Gases available N2, Ar, O2
Specifications
For use with substrates of organic materials, polyimides, parylene, etc.
Technology Overview
Sample Requirements and Preparation
Spin on Polyimide sample for metal deposition must be prepared in cleanroom.
- Thickness: < 13um
- Soft bake above 120 C longer than 30 seconds.
- Curing in cleanroom /wiki/spaces/BNCWiki/pages/6228522 at:
- 1) 200C for a minimum of 30 minutes
Followed by: - 2) A minimum of 300 C for a minimum of 60 minutes
- 1) 200C for a minimum of 30 minutes
- Gradual cooling to room temperature (cooling overnight)
Standard Operating Procedure
Please Note: This instrument is billed per use based on a 2 hour block
Example : 1 user only uses the tool per use. When you vent the system and unload your sample that concludes your reservation .
Example: If the usage is 10+ minutes past the initial 2 hour reservation, you will be billed for 2 uses
Questions & Troubleshooting
Process Library