Overview

Omicron surface analysis cluster

X-ray photoelectron spectroscopy (XPS) -- surface chemical composition
low energy electron diffraction (LEED) – macroscopic surface structure
state-of-the-art UHV scanning tunneling microscopy and atomic force microscopy (STM/AFM) – atomic arrangement
high-resolution electron energy loss spectroscopy (HREELS) -- vibrational structure (adsorbed species, phonons, etc.)
synthesize a material with required surface composition under UHV and to perform full characterization without taking the sample out
UHV treatment chamber (120 K – 1000 K), various gasses including metal-organic precursors, mass-spectrometer, also following deposition capabilities:
- e-beam evaporators (2 sources for simultaneous use)
- thermal evaporators (Zn, Te, Bi, Se; other metals possible)
- sputtering source for refractory metals (Ta, etc.)
- gas manifolds for UHV atomic layer deposition (ALD)
- atomic hydrogen source, etc.

Kratos Axis Ultra DLD imaging XPS instrument

Monochromatic X-ray source to minimize radioactive and thermal damage and improve the resolution
Charge neutralizer to study non-conducting samples minimizing non-homogeneous charge and improving the resolution
Real time imaging XPS to allow x- y- chemical mapping
Reaction cell (CatCell) to treat samples under different gas mixtures up to 6 bar at up to 1000°C, the transfer between the CatCell and the analysis chamber is under UHV without any contact to air
Sputtering gun, which can use either Ar+ or coronene (C24) for non-destructive depth profiling
UV-lamp to perform Ultra-Violet Photoemission Spectroscopy (UPS)
Ar-filled glove-box attached directly to the entry-lock of the XPS instrument to analyze air- and moisture sensitive samples (for instance Li ion battery or transition metal dichalcogenides, etc.)

Senior Research Scientist in charge: Dmitry Zemlyanov

Panalytical MRD X'Pert Pro high resolution x-ray diffractometer (XRD)

thin films, both single crystal and polycrystalline (diffraction & XRR), size up to 4” wafer
Anton Paar DHS 900 domed hot stage for measurements up to 900°C
Crystal orientation/offcut
Degree of crystallinity
Stresses/strain of single crystal thin film
Spatial mapping (100 x 100 mm motion) of sample surfaces
High speed wide angle x-ray diffraction and fast mode reciprocal space mapping
Density and film thickness determination (x-ray reflectivity XRR)
Pole figure
Low angle measurement as low as 0.1 °

Research Scientist in charge: H akan Salihoglu

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