Overview

Omicron surface analysis cluster

• X-ray photoelectron spectroscopy (XPS) -- surface chemical composition

• low energy electron diffraction (LEED) – macroscopic surface structure

• state-of-the-art UHV scanning tunneling microscopy and atomic force microscopy (STM/AFM) – atomic arrangement

• high-resolution electron energy loss spectroscopy (HREELS) -- vibrational structure (adsorbed species, phonons, etc.)

• synthesize a material with required surface composition under UHV and to perform full characterization without taking the sample out

• UHV treatment chamber (120 K – 1000 K), various gasses including metal-organic precursors, mass-spectrometer, also following deposition capabilities:

  • e-beam evaporators (2 sources for simultaneous use)

  • thermal evaporators (Zn, Te, Bi, Se; other metals possible)

  • sputtering source for refractory metals (Ta, etc.)

  • gas manifolds for UHV atomic layer deposition (ALD)

  • atomic hydrogen source, etc.

Kratos Axis Ultra DLD imaging XPS instrument 

Open

• Monochromatic X-ray source to minimize radioactive and thermal damage and improve the resolution

• Charge neutralizer to study non-conducting samples minimizing non-homogeneous charge and improving the resolution

• Real time imaging XPS to allow x- y- chemical mapping

• Reaction cell (CatCell) to treat samples under different gas mixtures up to 6 bar at up to 1000°C, the transfer between the CatCell and the analysis chamber is under UHV without any contact to air

• Sputtering gun, which can use either Ar+ or coronene (C24) for non-destructive depth profiling

• UV-lamp to perform Ultra-Violet Photoemission Spectroscopy (UPS)

• Ar-filled glove-box attached directly to the entry-lock of the XPS instrument to analyze air- and moisture sensitive samples (for instance Li ion battery or transition metal dichalcogenides, etc.)

Panalytical MRD X'Pert Pro high resolution x-ray diffractometer (XRD)

Open

• thin films, both single crystal and polycrystalline (diffraction & XRR), size up to 4” wafer

• Anton Paar DHS 900 domed hot stage for measurements up to 900°C

• Crystal orientation/offcut

• Degree of crystallinity

• Stresses/strain of single crystal thin film

• Spatial mapping (100 x 100 mm motion) of sample surfaces

• High speed wide angle x-ray diffraction and fast mode reciprocal space mapping

• Density and film thickness determination (x-ray reflectivity XRR)

• Pole figure

• Low angle measurement as low as 0.1 °