/
Photoresist Removal
Photoresist Removal
Overview
After photoresist is no longer needed, it may be removed through a variety of solvent and acid methods.
Solvents
Solvent removal requires less PPE than acid/bases, and may be done in the lithography hoods.
Acetone
Acetone will quickly remove positive photoresist and PMMA, but is not ideal for bulk PR removal due to its fast evaporation.
If acetone is used, the sample should quickly be moved into an IPA (or second acetone) bath to prevent evaporation and redeposition of resist.
, multiple selections available,
Related content
Photoresists
Photoresists
More like this
Keyence VHX-950F Digital Microscope
Keyence VHX-950F Digital Microscope
More like this
Cleaning
Cleaning
More like this
Suss MJB3 UV400 Mask Aligner
Suss MJB3 UV400 Mask Aligner
More like this
Suss MA6 Mask Aligner
Suss MA6 Mask Aligner
More like this
Spin Coating
Spin Coating
More like this