Overview

After photoresist is no longer needed, it may be removed through a variety of solvent and acid methods.

Solvents

Solvent removal requires less PPE than acid/bases, and may be done in the lithography hoods.

Acetone

Acetone will quickly remove positive photoresist and PMMA, but is not ideal for bulk PR removal due to its fast evaporation.

If acetone is used, the sample should quickly be moved into an IPA (or second acetone) bath to prevent evaporation and redeposition of resist.