Branson Asher
iLab Name: Branson
iLab Kiosk: BRK Etch Core
FIC: Shared
Owner: Francis Manfred
Location: Cleanroom - K Bay
Maximum Wafer Size: 6"/150 mm
Overview
General Description
The Branson Asher plasma system generates a low pressure, low temperature gaseous plasma. Plasma reactions such as ashing, etching, and polymer surface modification can be performed. Typical applications include cleaning substrates, curing PDMS, and stripping photo resist or other organics using Ar/O2 plasma.
Technology Overview
Equipment Overview
Branson Asher Cabinet/Enclosure
- Process Programmer front panel controls and indicators
- Convectin gauge for chamber pressure readout
- Process chamber
- Plasma controller
- RF Generator
Branson Asher Component Descriptions
Standard Operating Procedure
Training / SOP Video
Written SOP
The following instructions are meant to be a guide, but some process parameters may change based on your samples and experience. Please note that the chamber components are delicate; do not bump the etch tunnel assembly or drop the sample boat. If the RF generator is powered off, do not attempt to turn it back on unless specifically instructed by a lab staff member.
Initial tool state inspection
- Log into iLab, navigate to the BRK Etch Kiosk, and activate your Branson Asher Session to power on the control PC monitor.
- After successfully starting your kiosk session you should see the 275 Convectron Gauge turn ON and show approximately atmospheric pressure (~760 Torr).
- The switches for the Process Programmer PM906T should be in the following state.
- Switch 1, up position for Manual operation.
- Switch 2, down position for Vacuum OFF indicator light is OFF.
- Switch 3, down position for Purge OFF indicator light is OFF.
The controls for the Plasma Controller PM325 should be in the following state.
- Knob 1 should be rotated fully clockwise to the OFF position
- Knob 2 should be rotated fully clockwise to the OFF position
- Switch 3 should be in the down position for Ar flow OFF
- Switch 4 should be in the down position for O2 flow OFF
- Switch 5 should be in the down position for RF power OFF
- Knob 6 should be rotated fully counterclockwise to the OFF position
- Switch 7 should be in the up position indicating FWD power
- Gauge 8 should currently read 0 or full left postion
- Knob 1 should be rotated fully clockwise to the OFF position
The Ready indicator of the RF Generator PM1 should be lit green indicating the AC power is on, warmed up and ready to provide RF power.
Processing a wafer
- Open the door to the etch chamber
- Remove the quartz boat from the chamber.
- Place your samples in the quartz boat.
- Return the boat to the etch chamber.
- Close the chamber door.
Turn the vacuum switch to the ON position. The indicator should illuminate and pressure will begin falling indicated by the 275 Convectron Gauge.
After chamber pressure reaches < 200 mTorr, turn the Argon and/or O2 Gas flow switches to the ON position.
Adjust the Ar and O2 flow valves to achieve the desired pressure in the etch chamber.
The process must operate between 1 Torr and 2 Torr chamber pressure to achieve desired results. Do not operate the system outside this pressure band.
Typical values for Ar flow, indicated by the ball inside the rotameter, range from 120 - 140 (These values are relative as the gauge is not calibrated to the gas)
- Typical values for the O2 flow, indicated by the two balls inside the rotameter, range from 12-14 for the upper ball, and 6-7 for the lower ball (These values are relative as the gauge is not calibrated to the gas)
Make sure the RF power adjustment knob (2) is turned fully counter clockwise, switch the RF Power toggle (1) to the Up or ON position.
Make sure the FWD / REFL switch (3) is in the Up or FWD position and adjust the RF power adjustment knob (2) clockwise until the desired power level is reached.
- Processing power capability ranges from about 10 - 500 Watts, with 100-200 Watts typical.
Begin timing.
You can verify proper plasma ignition two ways while running the process.
Turn off the lights in the cleanroom bay, and observe the purple glow visible inside the chamber. It is difficult to see without turning the lights off.
- Flip the FWD / REFL switch on the Plasma Controller PM325 to the down position indicating reflected power. REFL or reflected power should indicate at or near zero when plasma has properly ignited.
When etch is done, turn the RF POWER switch OFF,then turn the RF LEVEL control to zero.
Turn the Argon and/or O2 Gas flow switches OFF and let pump to < 200 mTorr.
Turn the VACUUM switch OFF.
Flip up the handle on the door and rotate to the right - BUT DO NOT PULL ON THE HANDLE!
Turn the PURGE switch ON.
Wait for the door to open, then flip the PURGE switch to the OFF position.
Remove your sample(s).
Return quartz boat to the chamber.
Close and latch the chamber door.
Sign out of the coral system.
Questions & Troubleshooting
Process Library