Spaces
Apps
Templates
Create
Birck Nanotechnology Center Wiki
All content
Space settings
Shortcuts
Recharge Rates
Recharge Rates
This trigger is hidden
Equipment Status
Equipment Status
This trigger is hidden
Metallization Sources
Metallization Sources
This trigger is hidden
iLab - Purdue
iLab - Purdue
This trigger is hidden
BNC Help Desk
BNC Help Desk
This trigger is hidden
BNC User Training
BNC User Training
This trigger is hidden
BNC Website
BNC Website
This trigger is hidden
BRK SDS Repository
BRK SDS Repository
This trigger is hidden
Content
Results will update as you type.
Info Pages
Fabrication
Processing
Thermal
Patterning
Etching
ICP RIE
CCP RIE
•
Branson Asher
•
March Jupiter II Etcher
•
PIE Scientific Tergeo-Plus Plasma Cleaner #1
•
AJA ICP Argon Ion Mill Etcher
•
Xactix E1 Xenon Difluoride (XeF2) Etcher
•
Tousimis Automegasamdri 915B Critical Point Dryer
•
Wet Etching
•
Tutorial on Etching
Deposition
Back-end
Bio-fabrication
Roll-to-Roll
Other Fabrication
Characterization
Birck Nanotechnology Center Wiki
/
/
Etching
/
CCP RIE
CCP RIE
Wirth, Justin C
Hosler, Richard S
Former user (Deleted)
Owned by
Wirth, Justin C
Last updated:
Aug 01, 2019
by
Hosler, Richard S
Loading data...
Branson Asher
March Jupiter II Etcher
PIE Scientific Tergeo-Plus Plasma Cleaner #1
{"serverDuration": 13, "requestCorrelationId": "d5d102d26ee143598664f0bb079d268c"}