Plasma-Therm Versaline DSE Deep Silicon Etcher
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iLab Kiosk | |
FIC | Shared |
Owner | |
Location | BRK 2100K |
Max. Wafer | 200 mm / 8 in |
Info Links |
Overview
General Description
This is a Deep Silicon Etcher (DSE) that uses the Bosch process. This tool replaces the STS Advanced Silicon Etcher (ASE).
Specifications
This is a Deep Silicon Etcher (DSE) that uses a 3-step Bosch process (Passivation - Etch - Etch).
Max ICP power is 3,500w and max Bias Power is 600w
Available gases are C4F8, SF6, Ar & O2.
Sample Requirements and Preparation
Samples that may be used in the tool, materials that are compatible/incompatible, and the required cleaning before the tool may be used. May include both an "ideal" clean and a minimum required clean. Also include BOE/oxide removal, dehydration, or any recommended post process steps.
Standard Operating Procedure
Process Control Information
Process Control Context
Process Control Charts
Questions & Troubleshooting
Question about tool use or process result?
Answer to question.
Process Library
Create process template for tool, allows a user to fill in the details of their process.
References
Manufacturer brochures, specifications, papers with relevant info on process, and presentations covering the technology. Confluence lacks a native reference feature, so these are added as links.