Plasma-Therm Versaline DSE Deep Silicon Etcher
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iLab Kiosk | |
FIC | Shared |
Owner | |
Location | BRK 2100K |
Max. Wafer | 200 mm / 8 in |
Info Links |
Overview
General Description
This is a Deep Silicon Etcher (DSE) that uses the Bosch process. This tool replaces the STS Advanced Silicon Etcher (ASE).
Specifications
This is a Deep Silicon Etcher (DSE) that uses a 3-step Bosch process (Passivation - Etch - Etch).
Max ICP power is 3,500w and max Bias Power is 600w
Available gases are C4F8, SF6, Ar & O2.
Sample Requirements and Preparation
Samples that may be used in the tool, materials that are compatible/incompatible, and the required cleaning before the tool may be used. May include both an "ideal" clean and a minimum required clean. Also include BOE/oxide removal, dehydration, or any recommended post process steps.
Standard Operating Procedure
Standard procedure for tool operation, base off established Birck SOPs.
Process Control Information
Process Control Context
Process Control Charts
Questions & Troubleshooting
Question about tool use or process result?
Answer to question.
Process Library
Create process template for tool, allows a user to fill in the details of their process.
References
Manufacturer brochures, specifications, papers with relevant info on process, and presentations covering the technology. Confluence lacks a native reference feature, so these are added as links.