Plasma-Therm Versaline DSE Deep Silicon Etcher

Plasma-Therm Versaline DSE Deep Silicon Etcher

iLab Name

C - Plasma-Therm Versaline DSE Deep Silicon Etcher

iLab Kiosk

BRK Etch Core

FIC

Shared

Owner

Francis Manfred

Location

BRK 2100K

Max. Wafer

200 mm / 8 in

Info Links

SOP | InternalStaff

BRKSC-FRM-_45__PXL_20240714_171035770.jpg

Overview

General Description

This is a Deep Silicon Etcher (DSE) that uses the Bosch process. This tool replaces the STS Advanced Silicon Etcher (ASE).

Specifications

This is a Deep Silicon Etcher (DSE) that uses a 3-step Bosch process (Passivation - Etch - Etch).

  • Max ICP power is 3,500w and max Bias Power is 600w

  • Available gases are C4F8, SF6, Ar & O2.

Sample Requirements and Preparation

Samples that may be used in the tool, materials that are compatible/incompatible, and the required cleaning before the tool may be used. May include both an "ideal" clean and a minimum required clean. Also include BOE/oxide removal, dehydration, or any recommended post process steps.

 

Standard Operating Procedure

Process Control Information

Process Control Context

 

Process Control Charts

 

 

Questions & Troubleshooting

Question about tool use or process result?
Answer to question.

 

Process Library

Create process template for tool, allows a user to fill in the details of their process. 

 

References

Manufacturer brochures, specifications, papers with relevant info on process, and presentations covering the technology. Confluence lacks a native reference feature, so these are added as links.