Plasma-Therm Apex SLR ICP RIE Etcher

Owned by Former user (Deleted)
Last updated: Nov 14, 2024 by Ethan Zhang
1 min read



Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.

StatusUp
Issue Date and Description


Estimated Fix Date and Comment


Responding StaffFrancis

Plasma-Therm Apex SLR HDPCVD

iLab Name

Plasma-Therm Apex SLR ICP RIE Etcher

iLab Kiosk


FIC

Shared

Owner

Francis Manfred

Location

Cleanroom - K Bay

Max. Wafer

6"

Internal Page
Staff Page

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Overview

TypeMaterialsRestricted MaterialsAvailable GasesMax RF PowerWafer Size
ICP RIESi, Oxides, III-IV's, Ti, Al, SiCAu, Ag, Pt, CuAr, CHF3, CF4, SF6, Cl2, N2, O2, BCl3, H22000 ICP / 600 Platen6 inch (150 mm) SEMI Specification

General Description



Specifications


Factory Support:

     Plasma-Therm APEX SLR Website

     Paris Harvey - Field Service Engineer

  • 727-687-7947 mobile
  • paris.harvey@plasmatherm.com
  • Paris did the initial tool commissioning and installation in August 2019. He was great to work with and had worked in manufacturing on these tools as well, so he knew it inside and out.

     JJ Whitehead - Field Service Engineer


     Plasma Power Supply

  • 600W 13.56MHz Bias Supply
  • 2kW 2MHz ICP




Sample Requirements and Preparation


Standard Operating Procedure


Questions & Troubleshooting



Process Library

References