Status	Problem
Issue Date and Description	5/1/2026 Stage is off alignment by about 20 degrees, possibly due to power outage issues 2/25/26 Back-right magnetron (Ru source) will not light plasma
Estimated Fix Date and Comment	Stage is properly aligned. Back right magnetron is shorted and likely needs to be sent back to manufacturer for rebuild
Responding Staff	Dave Lubelski/Ethan Zhang

iLab Name	C - PVD Sputtering System - 4 Target Magnetic Sources
iLab Kiosk	BRK Evaporation Sputtering Core
FIC	Joerg Appenzeller
Owner	Dave Lubelski
Location	Cleanroom - S Bay
Max. Wafer	4"/100 mm

Current Sources	Co20Fe60B (at%), MgO, Ru, Ta
Potential Sources	Ta, Ru, MgO, Cu, W, NiFe, CoFeB, Mo

Overview

General Description

Magnetic sputtering system

Specifications

DC/RF sputtering system, Base pressure of 2x10-6 torr, reactive sputtering capable, Materials include: Ta, Ru, MgO, Cu, W, NiFe, CoFeB, Mo, heated stage capable of 450 degrees C

Technology Overview

_{No Organics/Polymers Allowed}

Sample Requirements and Preparation

Standard Operating Procedure

Please Note: This instrument is billed per use based on a 2 hour block

Example : 1 user only uses the tool per use. When you vent the system and unload your sample that concludes your reservation .

Example: If the usage is 10+ minutes past the initial 2 hour reservation, you will be billed for 2 uses

Questions & Troubleshooting

PVD Sputtering System - 4 Target Magnetic Sources