Status	UP
Issue Date and Description	8/19/2025 Back right magnetron is shorted. This may be due to magnetron damage or slight misalignment of the target. Other 3 magnetrons are available and working
Estimated Fix Date and Comment	10/9/2025 Back right magnetron functionality restored. Previously-installed shield was shorting the magnetron.
Responding Staff	Dave Lubelski/Dan Witter

iLab Name	C - PVD Sputtering System - Flexible Substrate Compatible
iLab Kiosk	BRK Evaporation Sputtering Core
FIC	Hugh Lee
Owner	Dave Lubelski
Location	Cleanroom - S Bay
Max. Wafer	4"/100 mm

Current Sources	Pt, Ti, SiO2, Au
Potential Sources	SiO2, TiN, Au, Ti, Ag, Cu, Si3N4, Al, Ni, Si, NbTi, Cr, Ge, Pt, Ni/Ti, Nb, Ta, ITO, MgO, W, Al2O3, CoFeB, TiO2

Overview

General Description

For use with substrates of organic materials, polyimides, parylene, etc.

Please Note: This instrument is billed per use based on a 2 hour block

Example : 1 user only uses the tool per use. When you vent the system and unload your sample that concludes your reservation .

Example: If the usage is 10+ minutes past the initial 2 hour reservation, you will be billed for 2 uses