Status	UP
Issue Date and Description
Estimated Fix Date and Comment
Responding Staff	Ethan Zhang

iLab Name	C - PVD Sputtering System - Metal/Dielectric Sources
iLab Kiosk	BRK Evaporation Sputtering Core
FIC	Peter Bermel
Owner	Ethan Zhang
Location	Cleanroom - S Bay
Max. Wafer	4"/100 mm

Current Sources	Cu W Al Ti
Potential Sources	Ag, Al, Al₂O₃, Au, Cr, Cu, Ge, MoSi₂, Nb, Nb70Ti30(wt%), Pt, Ru, Si, Si₃N₄, SiO₂, Ta, Ti, TiN, TiO₂, W, W₃Si₄

Overview

General Description

Metal/dielectric sputtering system

DC/RF sputtering capable, 2" targets, base pressure 2x10-6 torr, water cooled stage

_{No Organics/Polymers Allowed}