Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.

Status	UP
Issue Date and Description
Estimated Fix Date and Comment
Responding Staff

iLab Name: ASM F120 ALD
iLab Kiosk:
FIC: Peter Ye
Owner: N/A
Location: Cleanroom - G bay
Maximum Wafer Size: 2"/50 mm

Overview

General Description

Atomic Layer Deposition for growing crystals - Al2O3, HfO2, ZrO2, and Ga2O3

Specifications

Silicon substrates only

Technology Overview

Sample Requirements and Preparation

Standard Operating Procedure

Questions & Troubleshooting

Process Library

References

F120_SAT_Drawings Manual_01L5201 (Internal Resource)

F120_SAT_Operator Manual_Rev4 (Internal Resource)

Birck Nanotechnology Center Wiki

ASM F120 ALD

Analytics