ASM F120 ALD
Status | UP |
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ASM F120 ALD - Internal Resources
iLab Name: ASM F120 ALD
iLab Kiosk:
FIC: Peter Ye
Owner: N/A
Location: Cleanroom - G bay
Maximum Wafer Size: 2"/50 mm
Overview
General Description
Atomic Layer Deposition for growing crystals - Al2O3, HfO2, ZrO2, and Ga2O3
Specifications
Silicon substrates only
Technology Overview
Sample Requirements and Preparation
Standard Operating Procedure
Questions & Troubleshooting
Process Library
References