ASM F120 ALD


Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status
: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.

StatusUP
Issue Date and Description


Estimated Fix Date and Comment

Responding Staff

/wiki/spaces/BNCWiki/pages/6235994


iLab Name: ASM F120 ALD
iLab Kiosk:
FIC:
Peter Ye
Owner:
N/A
Location:
 Cleanroom - G bay
Maximum Wafer Size: 
2"/50 mm

Overview

General Description

Atomic Layer Deposition for growing crystals - Al2O3, HfO2, ZrO2, and Ga2O3

Specifications

Silicon substrates only


Technology Overview 

 


Sample Requirements and Preparation


Standard Operating Procedure


Questions & Troubleshooting



Process Library