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AJA E-Beam Evaporation and Sputtering System

AJA E-Beam Evaporation and Sputtering System

Owned by Wirth, Justin C
Last updated: Sept 06, 2022 by Hao Li


Refer to the Material and Process Compatibility page for information on materials compatible with this tool.
Equipment Status: Set as UP, PROBLEM, or DOWN, and report the issue date (MM/DD) and a brief description. Italicized fields will be filled in by BNC Staff in response to issues. See Problem Reporting Guide for more info.

StatusWIP
Issue Date and Description


Estimated Fix Date and Comment

Responding Staff



iLab Name

TBD

iLab Kiosk

TBD

FIC

Leonid Rokhinson

Owner

Leonid Rokhinson

Location

Cleanroom - J Bay

Max. Wafer

4"/100 mm

Internal Page/wiki/spaces/BNCWiki/pages/6247966
Staff Page

Overview

General Description

A multi-deposition system capable of e-beam evaporation and sputtering. Targets include:

  • Sputtering, 3" targets: Nb, NbTi, Ti
  • Sputtering 2" targets: MoRe, Nb, Cu
  • E-beam Evaporation: Ti,Ge,Pd,Au,Al

Specifications


Sample Requirements and Preparation


Standard Operating Procedure


Questions & Troubleshooting



Process Library

References


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