Spinner Allowed Chemicals - 2018 Version
With the install of the new spinners, materials will be segregated by spinner. Please see the following page for what spinner you will need to use for a particular material once the spinners are reclasiffied.
The categories and allowed chemical/spinner pairings are still being refined and your feedback would be appreciated. Please comment on this page (at the page bottom) with any questions, comments, or feedback.
Spinner 1 & 2 : Acetone Soluble Resists
Spinner 3: SU-8, PGME Resists, Plastics, and other Spin-on-Materials (Foil required)
Spinner 4: EBL/NIL (Foil required)
Specifically not permitted in Cleanroom
Silicones/PDMS
Reason: These are impossible to remove chemically once cured, and are not used for lithography processes. Email Joon Park for information on proper curing of HMDS outside the cleanroom.
- Sylgard 182
- Sylgard 184
100% HMDS
Reason: 100% HMDS is extremely hazardous for both skin contact and inhalation. Additionally, in air, it degrades into ammonia upon evaporation, which crosslinks common photoresist. It gives sub-optimal results compared to diluted (80% PGMEA + 20% HMDS) solutions, or SurPass. Contact Justin Wirth with any questions.
- HMDS/Hexamethyldisilazane